III-V 4D Transistors
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| dc.contributor.author |
Gu, J.J. |
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| dc.contributor.author |
Wang, Xinwei
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| dc.contributor.author |
Shao, J. |
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| dc.contributor.author |
Neal, A.T. |
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| dc.contributor.author |
Gordon, Roy Gerald
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| dc.contributor.author |
Manfra, M.J. |
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| dc.contributor.author |
Ye, P.D. |
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| dc.date.accessioned |
2012-12-07T21:42:50Z |
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| dc.date.issued |
2012 |
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| dc.identifier.citation |
Gu, J. J., X. W. Wang, J. Shao, A.T. Neal, M. J. Manfra, R. G. Gordon, and P. D. Ye. 2012. III-V 4D Transistors. In Proceedings of the 70th Annual Device Research Conference (DRC 2012), June 18-20, 2012, University Park, Pennsylvania. Piscataway: Ieee Press Books. |
en_US |
| dc.identifier.isbn |
9781467311632 |
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| dc.identifier.isbn |
1467311634 |
en_US |
| dc.identifier.issn |
1548-3770 |
en_US |
| dc.identifier.uri |
http://nrs.harvard.edu/urn-3:HUL.InstRepos:10021409 |
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| dc.description.abstract |
We fabricated for the first time vertically and laterally integrated III-V 4D transistors. III-V gate-all-around (GAA) nanowire MOSFETs with \(3×4\) arrays show high drive current of \(1.35mA/ \mu m\) and high transconductance of \(0.85mS/ \mu m\). The vertical stacking of the III-V nanowires have provided an elegant solution to the drivability bottleneck of nanowire devices and is promising for future low-power logic and RF application. |
en_US |
| dc.description.sponsorship |
Chemistry and Chemical Biology |
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| dc.language.iso |
en_US |
en_US |
| dc.publisher |
Institute of Electrical and Electronics Engineers |
en_US |
| dc.relation.isversionof |
doi:10.1109/DRC.2012.6256964 |
en_US |
| dash.license |
OAP |
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| dc.subject |
fabrication |
en_US |
| dc.subject |
indium gallium arsenide |
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| dc.subject |
indium phosphide |
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| dc.subject |
logic gates |
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| dc.subject |
MOSFETs |
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| dc.subject |
nanobioscience |
en_US |
| dc.subject |
nanoscale devices |
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| dc.subject |
III-V semiconductors |
en_US |
| dc.subject |
MOSFET |
en_US |
| dc.subject |
indium compounds |
en_US |
| dc.subject |
III-V 4D transistor |
en_US |
| dc.subject |
III-V gate-all-around nanowire MOSFET |
en_US |
| dc.subject |
InGaAs |
en_US |
| dc.subject |
RF application |
en_US |
| dc.subject |
drivability bottleneck |
en_US |
| dc.subject |
laterally integrated III-V 4D transistor |
en_US |
| dc.subject |
low-power logic application |
en_US |
| dc.subject |
nanowire device |
en_US |
| dc.subject |
transconductance |
en_US |
| dc.subject |
vertical stacking |
en_US |
| dc.subject |
vertically integrated III-V 4D transistor |
en_US |
| dc.title |
III-V 4D Transistors |
en_US |
| dc.type |
Monograph or Book |
en_US |
| dc.description.version |
Accepted Manuscript |
en_US |
| dc.relation.journal |
IEEE Device Research Conference, 2012 70th Annual |
en_US |
| dash.depositing.author |
Gordon, Roy Gerald
|
|
| dc.date.available |
2012-12-07T21:42:50Z |
|
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FAS Scholarly Articles [5137]
Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University
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