Browsing FAS Scholarly Articles by Keyword "chemical vapor deposition"
Now showing items 1-4 of 4
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Chemical Vapor Deposition (CVD) of Manganese Self-Aligned Diffusion Barriers for Cu Interconnections in Microelectronics
(Materials Research Society, 2009)Barriers to prevent diffusion of copper, oxygen and water vapor were formed by CVD using a manganese precursor vapor that reacts with silica surfaces. The manganese metal penetrates only a few nanometers into the silica ... -
Low Temperature Chemical Vapor Deposition of Cuprous Oxide Thin Films Using a Copper(I) Amidinate Precursor
(American Chemical Society (ACS), 2019-10-23)Cuprous oxide (Cu2O) thin films were grown by chemical vapor deposition (CVD) using precursors (N, N’- di-sec-butylacetamidinato)copper(I) and degassed water at low substrate temperatures of 125 to 225 °C. Despite being a ... -
Nanowire Biosensors for Label-Free, Real-Time, Ultrasensitive Protein Detection
(Humana Press, 2011)Sensitive and quantitative analysis of proteins is central to disease diagnosis, drug screening, and proteomic studies. Among recent research advances exploiting new nanomaterials for biomolecule analysis, silicon nanowires ... -
Vapor Deposition of Copper-Manganese Interconnects
(IEEE, 2016)Chemical vapor deposition (CVD) of copper and manganese can produce interconnects scaled down to below 10 nm, while enhancing their conductivity and lifetime. CVD using similar super-conformal processes can enable very ...