Kinetic Energy Effects on Morphology Evolution During Pulsed Laser Deposition of Metal-On-Insulator Films

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Kinetic Energy Effects on Morphology Evolution During Pulsed Laser Deposition of Metal-On-Insulator Films

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dc.contributor.author Warrender, Jeffrey M.
dc.contributor.author Aziz, Michael
dc.date.accessioned 2009-04-13T19:19:38Z
dc.date.issued 2007
dc.identifier.citation Warrender, Jeffrey M. and Michael J. Aziz. 2007. Kinetic energy effects on morphology evolution during pulsed laser deposition of metal-on-insulator films. Physical Review B 75(8): 085433-085444. en
dc.identifier.issn 1098-0121 en
dc.identifier.uri http://nrs.harvard.edu/urn-3:HUL.InstRepos:2794941
dc.description.abstract We report an experimental comparison of Volmer-Weber metal-on-insulator growth morphology in pulsed laser deposition (PLD) and thermal deposition under identical thermal, background, and surface preparation conditions for Ag on SiO<sub>2</sub> and mica. Films exhibit a characteristic morphological progression from isolated three-dimensional islands to elongated clusters to a percolating, electrically conducting film to a pinhole-free film. We observed this same progression for films deposited by PLD. Kinetic Monte Carlo (KMC) simulations that take into account only the pulsed nature of the flux predict that PLD films should advance to percolation with less deposition than thermally deposited films under otherwise identical conditions. At low substrate temperatures, this prediction is confirmed. However, <i>in situ</i> resistance measurements and <i>ex situ</i> atomic force microscopy measurements demonstrate that at high substrate temperatures, PLD films require more deposition to reach percolation. PLD experiments performed at varying kinetic energy of the depositing Ag species suggest a regime in which increasing kinetic energy can delay the percolation transition. Comparison was made with KMC simulations of two-island coalescence in the presence of adatom-vacancy pair creation, which occurs with a greater-than-unity yield per incident ion at kinetic energy >50 eV. A mechanism controlling the delayed percolation of PLD films in the high-temperature regime is proposed: (1) the energetic deposition results in a net uphill flux from adatom-vacancy pair creation, inducing a vertical shape change; (2) taller-than-equilibrium islands coalesce more rapidly; (3) the result is an extended time period over which coalescence is efficient compared to island-island impingement; (4) the percolation transition is delayed en
dc.description.sponsorship Engineering and Applied Sciences en
dc.language.iso en_US en
dc.publisher American Physical Society en
dc.relation.isversionof http://dx.doi.org/10.1103/PhysRevB.75.085433 en
dash.license META_ONLY
dc.subject silver en
dc.subject Monte Carlo methods en
dc.subject metallic thin films en
dc.subject adsorbed layers en
dc.subject metal-insulator boundaries en
dc.subject pulsed laser deposition en
dc.subject percolation en
dc.subject vacancies (crystal) en
dc.subject atomic force microscopy en
dc.title Kinetic Energy Effects on Morphology Evolution During Pulsed Laser Deposition of Metal-On-Insulator Films en
dc.relation.journal Physical Review B en
dash.depositing.author Aziz, Michael
dash.embargo.until 10000-01-01

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  • FAS Scholarly Articles [6929]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

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