Ion Implantation and Annealing of SrTiO3 and CaTiO3

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Ion Implantation and Annealing of SrTiO3 and CaTiO3

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Title: Ion Implantation and Annealing of SrTiO3 and CaTiO3
Author: White, C. Woody; Rankin, J.; Boatner, L. A.; Aziz, Michael

Note: Order does not necessarily reflect citation order of authors.

Citation: Aziz, Michael J., L. A. Boatner, J. Rankin, and C. W. White. 1987. Ion Implantation and Annealing of SrTiO3 and CaTiO3. Materials Research Society Symposium Proceedings 93: 9-13.
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Abstract: Ion implantation damage and thermal annealing results are presented for single crystals of SrTiO3 and CaTiO3. The near-surface region of both of these materials can be made amorphous by low doses (~1015/cm2) of heavy ions (PB at 540 KeV). During annealing, the amorphous implanted region crystallizes epitaxially on the underlying single-crystal substrate. The kinetics of this solid-phase epitaxial recrystallization process have been measured by employing ion channeling techniques.
Published Version: http://www.mrs.org/s_mrs/sec.asp?CID=1727&DID=38980
Other Sources: http://www.seas.harvard.edu/matsci/people/aziz/publications/mja033.pdf
Terms of Use: This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:2839216

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  • FAS Scholarly Articles [6948]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University
 
 

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