Atomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanopores

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Atomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanopores

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Title: Atomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanopores
Author: Branton, Daniel; Chen, Peng; Farmer, Damon B.; Gordon, Roy; Golovchenko, Jene; Mitsui, Toshiyuki

Note: Order does not necessarily reflect citation order of authors.

Citation: Chen, Peng, Toshiyuki Mitsui, Damon B. Farmer, Jene Golovchenko, Roy G. Gordon, and Daniel Branton. 2004. Atomic layer deposition to fine-tune the surface properties and diameters of fabricated nanopores. Nano Letters 4(7): 1333-1337.
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Abstract: Atomic layer deposition of alumina enhanced the molecule sensing characteristics of fabricated nanopores by fine-tuning their surface properties, reducing 1/f noise, neutralizing surface charge to favor capture of DNA and other negative polyelectrolytes, and controlling the diameter and aspect ratio of the pores with near single Ångstrom precision. The control over the chemical and physical nature of the pore surface provided by atomic layer deposition produced a higher yield of functional nanopore detectors.
Published Version: http://dx.doi.org/10.1021/nl0494001
Other Sources: http://www.mcb.harvard.edu/branton/ChenEtAl2004.pdf
Terms of Use: This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:3109363

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  • FAS Scholarly Articles [7176]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University
 
 

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