Atomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanopores

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Atomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanopores

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dc.contributor.author Branton, Daniel
dc.contributor.author Chen, Peng
dc.contributor.author Farmer, Damon B.
dc.contributor.author Gordon, Roy
dc.contributor.author Golovchenko, Jene
dc.contributor.author Mitsui, Toshiyuki
dc.date.accessioned 2009-06-16T18:52:59Z
dc.date.issued 2004
dc.identifier.citation Chen, Peng, Toshiyuki Mitsui, Damon B. Farmer, Jene Golovchenko, Roy G. Gordon, and Daniel Branton. 2004. Atomic layer deposition to fine-tune the surface properties and diameters of fabricated nanopores. Nano Letters 4(7): 1333-1337. en
dc.identifier.issn 1530-6984 en
dc.identifier.uri http://nrs.harvard.edu/urn-3:HUL.InstRepos:3109363
dc.description.abstract Atomic layer deposition of alumina enhanced the molecule sensing characteristics of fabricated nanopores by fine-tuning their surface properties, reducing 1/f noise, neutralizing surface charge to favor capture of DNA and other negative polyelectrolytes, and controlling the diameter and aspect ratio of the pores with near single Ångstrom precision. The control over the chemical and physical nature of the pore surface provided by atomic layer deposition produced a higher yield of functional nanopore detectors. en
dc.description.sponsorship Molecular and Cellular Biology en
dc.description.sponsorship Physics en
dc.description.sponsorship Chemistry and Chemical Biology en
dc.description.sponsorship Engineering and Applied Sciences en
dc.language.iso en_US en
dc.publisher American Chemical Society en
dc.relation.isversionof http://dx.doi.org/10.1021/nl0494001 en
dc.relation.hasversion http://www.mcb.harvard.edu/branton/ChenEtAl2004.pdf en
dash.license LAA
dc.title Atomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanopores en
dc.type Journal Article
dc.description.version Version of Record
dc.relation.journal Nano Letters en
dash.depositing.author Branton, Daniel

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  • FAS Scholarly Articles [7106]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

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