Nanometer Patterning with Ice

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Nanometer Patterning with Ice

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Title: Nanometer Patterning with Ice
Author: Golovchenko, Jene; Schurmann, Gregor; Branton, Daniel; King, Gavin M.

Note: Order does not necessarily reflect citation order of authors.

Citation: King, Gavin M., Gregor Schurmann, Daniel Branton, and Jene A. Golovchenko. 2005. Nanometer patterning with ice. Nano Letters 5(6): 1157-1160.
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Abstract: Nanostructures can be patterned with focused electron or ion beams in thin, stable, conformal films of water ice grown on silicon. We use these patterns to reliably fabricate sub-20 nm wide metal lines and exceptionally well-defined, sub-10 nanometer beam-induced chemical surface transformations. We argue more generally that solid-phase condensed gases of low sublimation energy are ideal materials for nanoscale patterning, and water, quite remarkably, may be among the most useful.
Published Version: http://dx.doi.org/10.1021/nl050405n
Other Sources: http://www.mcb.harvard.edu/branton/KingEtAl.pdf
Terms of Use: This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:3109370

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  • FAS Scholarly Articles [7219]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University
 
 

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