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Title:	Nanometer Patterning with Ice
Author:	Golovchenko, Jene; Schurmann, Gregor; Branton, Daniel; King, Gavin M. Note: Order does not necessarily reflect citation order of authors.
Citation:	King, Gavin M., Gregor Schurmann, Daniel Branton, and Jene A. Golovchenko. 2005. Nanometer patterning with ice. Nano Letters 5(6): 1157-1160.
Full Text & Related Files:	Branton_NanometerPatterning.pdf (377.5Kb; PDF)
Abstract:	Nanostructures can be patterned with focused electron or ion beams in thin, stable, conformal films of water ice grown on silicon. We use these patterns to reliably fabricate sub-20 nm wide metal lines and exceptionally well-defined, sub-10 nanometer beam-induced chemical surface transformations. We argue more generally that solid-phase condensed gases of low sublimation energy are ideal materials for nanoscale patterning, and water, quite remarkably, may be among the most useful.
Published Version:	http://dx.doi.org/10.1021/nl050405n
Other Sources:	http://www.mcb.harvard.edu/branton/KingEtAl.pdf
Terms of Use:	This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA
Citable link to this page:	http://nrs.harvard.edu/urn-3:HUL.InstRepos:3109370

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