Nanometer Patterning with Ice

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dc.contributor.author	Golovchenko, Jene
dc.contributor.author	Schurmann, Gregor
dc.contributor.author	Branton, Daniel
dc.contributor.author	King, Gavin M.
dc.date.accessioned	2009-06-16T18:56:35Z
dc.date.issued	2005
dc.identifier.citation	King, Gavin M., Gregor Schurmann, Daniel Branton, and Jene A. Golovchenko. 2005. Nanometer patterning with ice. Nano Letters 5(6): 1157-1160.	en
dc.identifier.issn	1530-6984	en
dc.identifier.uri	http://nrs.harvard.edu/urn-3:HUL.InstRepos:3109370
dc.description.abstract	Nanostructures can be patterned with focused electron or ion beams in thin, stable, conformal films of water ice grown on silicon. We use these patterns to reliably fabricate sub-20 nm wide metal lines and exceptionally well-defined, sub-10 nanometer beam-induced chemical surface transformations. We argue more generally that solid-phase condensed gases of low sublimation energy are ideal materials for nanoscale patterning, and water, quite remarkably, may be among the most useful.	en
dc.description.sponsorship	Engineering and Applied Sciences	en
dc.description.sponsorship	Molecular and Cellular Biology	en
dc.language.iso	en_US	en
dc.publisher	American Chemical Society	en
dc.relation.isversionof	http://dx.doi.org/10.1021/nl050405n	en
dc.relation.hasversion	http://www.mcb.harvard.edu/branton/KingEtAl.pdf	en
dash.license	LAA
dc.title	Nanometer Patterning with Ice	en
dc.type	Journal Article
dc.description.version	Version of Record
dc.relation.journal	Nano Letters	en
dash.depositing.author	Branton, Daniel