Water Diffusion and Fracture Behavior in Nano-Porous Low-K Dielectric Film Stacks

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Water Diffusion and Fracture Behavior in Nano-Porous Low-K Dielectric Film Stacks

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dc.contributor.author Vlassak, Joost
dc.contributor.author Tsui, Ting T.
dc.contributor.author Li, Han
dc.date.accessioned 2009-06-25T14:17:14Z
dc.date.issued 2009
dc.identifier.citation Li, Han, Ting T. Tsui, and Joost J. Vlassak. Forthcoming. Water diffusion and fracture behavior in nano-porous low-k dielectric film stacks. Journal of Applied Physics 105. en
dc.identifier.issn 0021-8979 en
dc.identifier.uri http://nrs.harvard.edu/urn-3:HUL.InstRepos:3121069
dc.description.abstract Among various low-dielectric constant (‘low-k’) materials under development, organosilicate glasses (OSG) containing nanometer-size pores are leading candidates for use as intra-metal dielectrics in future microelectronics technologies. In this paper, we investigate the direct impact of water diffusion on the fracture behavior of film stacks that contain porous OSG coatings. We demonstrate that exposure of the film stacks to water causes significant degradation of the interfacial adhesion energy, but that it has negligible effect on the cohesive fracture energy of the nanoporous OSG layer. Isotope tracer diffusion experiments combined with dynamic secondary ion mass spectroscopy (SIMS) show that water diffuses predominantly along the interfaces, and not through the porous films. This unexpected result is attributed to the hydrophilic character of the interfaces. en
dc.description.sponsorship Engineering and Applied Sciences en
dc.language.iso en_US en
dc.publisher American Institute of Physics en
dc.relation.isversionof http://jap.aip.org/ en
dash.license OAP
dc.subject water diffusion en
dc.subject SIMS en
dc.subject cracking en
dc.subject porous en
dc.subject dielectrics en
dc.title Water Diffusion and Fracture Behavior in Nano-Porous Low-K Dielectric Film Stacks en
dc.type Journal Article
dc.description.version Accepted Manuscript
dc.relation.journal Journal of Applied Physics en
dash.depositing.author Vlassak, Joost

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  • FAS Scholarly Articles [6463]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

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