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Title:	Synthesis and Characterization of Ruthenium Amidinate Complexes as Precursors for Vapor Deposition
Author:	Gordon, Roy Gerald; Lim, Booyong S.; Li, Zhengwen; Aaltonen, Titta; Li, Huazhi Note: Order does not necessarily reflect citation order of authors.
Citation:	Li, Huazhi, Titta Aaltonen, Zhengwen Li, Booyong S. Lim, Roy G. Gordon. 2008. Synthesis and characterization of ruthenium amidinate complexes as precursors for vapor deposition. The Open Inorganic Chemistry Journal 2: 11-17.
Full Text & Related Files:	gordon_ruthenium.pdf (449.9Kb; PDF)
Abstract:	Three new ruthenium amidinate complexes were prepared: tris(diisopropylacetamidinato)-ruthenium(III), Ru(iPrNC(Me)NiPr)3 4; bis(diisopropyl-acetamidinato)ruthenium(II) dicarbonyl, Ru(iPrNC(Me)NiPr)2(CO)2 5; and bis(ditert- butylacetamidinato)ruthenium(II) dicarbonyl, Ru(tBuNC(Me)NtBu)2(CO)2 6. They have been synthesized and characterized by 1H NMR, TG and X-ray structure analysis. These three complexes were found to be monomeric and air stable. Compound 6 was found to have sufficient volatility and thermal stability for use in chemical vapor deposition (CVD) and atomic layer deposition (ALD) of ruthenium metal films.
Published Version:	http://dx.doi.org/10.2174/1874098700802010011
Other Sources:	http://www.chem.harvard.edu/groups/gordon/publicationsearch.html
Terms of Use:	This article is made available under the terms and conditions applicable to Open Access Policy Articles, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#OAP
Citable link to this page:	http://nrs.harvard.edu/urn-3:HUL.InstRepos:3347569

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