A Technique to Transfer Metallic Nanoscale Patterns to Small and Non-Planar Surfaces

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A Technique to Transfer Metallic Nanoscale Patterns to Small and Non-Planar Surfaces

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dc.contributor.author Smythe, Elizabeth J.
dc.contributor.author Dickey, Michael D.
dc.contributor.author Whitesides, George M.
dc.contributor.author Capasso, Federico
dc.date.accessioned 2009-12-21T16:27:11Z
dc.date.issued 2009
dc.identifier.citation Smythe, Elizabeth J., Michael D. Dickey, George M. Whitesides, Federico Capasso. 2009. A technique to transfer metallic nanoscale patterns to small and non-planar surfaces. ACS Nano 3(1): 59-65. en_US
dc.identifier.issn 1936-0851 en_US
dc.identifier.uri http://nrs.harvard.edu/urn-3:HUL.InstRepos:3445984
dc.description.abstract Conventional lithographic methods (e.g., electron-beam lithography, photolithography) are capable of producing high-resolution structures over large areas but are generally limited to large (>1 cm2) planar substrates. Incorporation of these features on unconventional substrates (i.e., small (<1 mm2) and/or non-planar substrates) would open possibilities for many applications, including remote fiber-based sensing, nanoscale optical lithography, three-dimensional fabrication, and integration of compact optical elements on fiber and semiconductor lasers. Here we introduce a simple method in which a thin thiol-ene film strips arbitrary nanoscale metallic features from one substrate and is then transferred, along with the attached features, to a substrate that would be difficult or impossible to pattern with conventional lithographic techniques. An oxygen plasma removes the sacrificial film, leaving behind the metallic features. The transfer of dense and sparse patterns of isolated and connected gold features ranging from 30 nm to 1 μm, to both an optical fiber facet and a silica microsphere, demonstrates the versatility of the method. A distinguishing feature of this technique is the use of a thin, sacrificial film to strip and transfer metallic nanopatterns and its ability to directly transfer metallic structures produced by conventional lithography. en_US
dc.description.sponsorship Engineering and Applied Sciences en_US
dc.language.iso en_US en_US
dc.publisher American Chemical Society en_US
dc.relation.isversionof doi:10.1021/nn800720r en_US
dc.relation.hasversion http://www.seas.harvard.edu/capasso/publications/Smythe_ACS_Nano_3_59_2009.pdf en_US
dash.license META_ONLY
dc.subject pattern transfer en_US
dc.subject soft lithography en_US
dc.subject metal nanoparticles en_US
dc.subject nanofabrication en_US
dc.subject nanopatterning en_US
dc.title A Technique to Transfer Metallic Nanoscale Patterns to Small and Non-Planar Surfaces en_US
dc.type Journal Article en_US
dc.description.version Version of Record en_US
dc.relation.journal ACS Nano en_US
dash.depositing.author Capasso, Federico
dash.embargo.until 10000-01-01

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  • FAS Scholarly Articles [7103]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

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