Controlled Modification of Erbium Lifetime by Near-Field Coupling to Metallic Films

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Controlled Modification of Erbium Lifetime by Near-Field Coupling to Metallic Films

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Title: Controlled Modification of Erbium Lifetime by Near-Field Coupling to Metallic Films
Author: Yu, Nanfang; Belyanin, Alexey; Bao, Jiming; Capasso, Federico

Note: Order does not necessarily reflect citation order of authors.

Citation: Yu, Nanfang, Alexey Belyanin, Jiming Bao, Federico Capasso. 2009. Controlled modification of erbium lifetime by near-field coupling to metallic films. New Journal of Physics 11(1): 015003.
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Abstract: Systematic measurements of the photoluminescence lifetime of the 1.54 μm transition of erbium implanted at different energies in SiO2 films with different metallic overlayers are reported. The lifetime shows a strong reduction up to a factor of 20 with decreasing distance between the erbium and the metal overlayer. The reduction of lifetime is mainly due to a near-field interaction between the erbium ions and the metal overlayers through generation of surface plasmon polaritons at the metal/SiO2 interface and direct generation of heat in the metal. These experiments combined with rigorous theoretical modeling demonstrate that a high degree of control over the radiative properties of erbium can be achieved in erbium-implanted materials in a wide range of implantation energies. The experiments also allow us to determine the radiative efficiency of erbium in bulk SiO2.
Published Version: doi:10.1088/1367-2630/11/1/015003
Terms of Use: This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:3448579

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  • FAS Scholarly Articles [7106]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University
 
 

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