Object Space EWA Surface Splatting: A Hardware Accelerated Approach to High Quality Point Rendering

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Object Space EWA Surface Splatting: A Hardware Accelerated Approach to High Quality Point Rendering

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dc.contributor.author Ren, Liu
dc.contributor.author Pfister, Hanspeter
dc.contributor.author Zwicker, Matthias
dc.date.accessioned 2010-06-16T14:01:23Z
dc.date.issued 2002
dc.identifier.citation Ren, Liu, Hanspeter Pfister, and Matthias Zwicker. 2002. Object space EWA surface splatting: A hardware accelerated approach to high quality point rendering. Computer Graphics Forum 21(3): 461-470. en_US
dc.identifier.issn 0167-7055 en_US
dc.identifier.uri http://nrs.harvard.edu/urn-3:HUL.InstRepos:4238986
dc.description.abstract Elliptical weighted average (EWA) surface splatting is a technique for high quality rendering of point-sampled 3D objects. EWA surface splatting renders water-tight surfaces of complex point models with high quality, anisotropic texture filtering. In this paper we introduce a new multi-pass approach to perform EWA surface splatting on modern PC graphics hardware, called object space EWA splatting. We derive an object space formulation of the EWA filter, which is amenable for acceleration by conventional triangle-based graphics hardware. We describe how to implement the object space EWA filter using a two pass rendering algorithm. In the first rendering pass, visibility splatting is performed by shifting opaque surfel polygons backward along the viewing rays, while in the second rendering pass view-dependent EWA prefiltering is performed by deforming texture mapped surfel polygons. We use texture mapping and alpha blending to facilitate the splatting process. We implement our algorithm using programmable vertex and pixel shaders, fully exploiting the capabilities of today’s graphics processing units (GPUs). Our implementation renders up to 3 million points per second on recent PC graphics hardware, an order of magnitude more than a pure software implementation of screen space EWA surface splatting. en_US
dc.description.sponsorship Engineering and Applied Sciences en_US
dc.language.iso en_US en_US
dc.publisher Wiley-Blackwell en_US
dc.relation.isversionof doi:10.1111/1467-8659.00606 en_US
dc.relation.hasversion http://www.ri.cmu.edu/pub_files/pub4/ren_liu_2002_1/ren_liu_2002_1.pdf en_US
dash.license LAA
dc.title Object Space EWA Surface Splatting: A Hardware Accelerated Approach to High Quality Point Rendering en_US
dc.type Journal Article en_US
dc.description.version Accepted Manuscript en_US
dc.relation.journal Computer Graphics Forum en_US
dash.depositing.author Pfister, Hanspeter
dc.date.available 2010-06-16T14:01:23Z

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  • FAS Scholarly Articles [7362]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

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