Nanoscale Imaging and Control of Resistance Switching in VO[sub]2 at Room Temperature

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Nanoscale Imaging and Control of Resistance Switching in VO[sub]2 at Room Temperature

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dc.contributor.author Hoffman, Jenny Eve
dc.contributor.author Kim, Jeehoon
dc.contributor.author Ko, Changhyun
dc.contributor.author Frenzel, Alex James
dc.contributor.author Ramanathan, Shriram
dc.date.accessioned 2010-08-16T14:18:43Z
dc.date.issued 2010
dc.identifier.citation Kim, Jeehoon, Changhyun Ko, Alex Frenzel, Shriram Ramanathan, and Jennifer E. Hoffman. 2010. Nanoscale imaging and control of resistance switching in VO[sub]2 at room temperature. Applied Physics Letters 96 (213106). en_US
dc.identifier.issn 0003-6951 en_US
dc.identifier.uri http://nrs.harvard.edu/urn-3:HUL.InstRepos:4342532
dc.description.abstract We demonstrate controlled local phase switching of a VO[sub]2 film using a biased conducting atomic force microscope tip. After application of an initial, higher ‘training’ voltage, the resistance transition is hysteretic with IV loops converging upon repeated voltage sweep. The threshold Vset to initiate the insulator-to-metal transition is on order ∼ 5 V at room temperature, and increases at low temperature. We image large variations in Vset from grain to grain. Our imaging technique opens up the possibility for an understanding of the microscopic mechanism of phase transition in VO[sub]2 as well as its potential relevance to solid state devices. en_US
dc.description.sponsorship Engineering and Applied Sciences en_US
dc.description.sponsorship Physics en_US
dc.language.iso en_US en_US
dc.publisher American Institute of Physics en_US
dc.relation.isversionof doi:10.1063/1.3435466 en_US
dash.license OAP
dc.title Nanoscale Imaging and Control of Resistance Switching in VO[sub]2 at Room Temperature en_US
dc.type Journal Article en_US
dc.description.version Accepted Manuscript en_US
dc.relation.journal Applied Physics Letters en_US
dash.depositing.author Hoffman, Jenny Eve
dc.date.available 2010-08-16T14:18:43Z

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  • FAS Scholarly Articles [6463]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

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