Thermal Diffuse X-Ray-Scattering Studies of the Water-Vapor Interface
| Title: | Thermal Diffuse X-Ray-Scattering Studies of the Water-Vapor Interface |
| Author: |
Schwartz, D. K.; Schlossman, M. L.; Kawamoto, E. H.; Kellogg, G. J.; Pershan, Peter S.; Ocko, B. M.
Note: Order does not necessarily reflect citation order of authors. |
| Citation: | Schwartz, D. K., M. L. Schlossman, E. H. Kawamoto, G. J. Kellogg, Peter S. Pershan, and B. M. Ocko. 1990. Thermal diffuse x-ray-scattering studies of the water-vapor interface. Physical Review A 41(10): 5687-5690. |
| Full Text & Related Files: |
Schwartz_Thermal.pdf (699.6Kb; PDF) 
|
| Abstract: | Agreement between the theoretical and measured resolution dependence of x-ray specular reflection from the H2O-vapor interface shows that the macroscopic capillary model for surface roughness can be extended to length scales as small as 400 Å. Agreement between measured thermal diffuse scattering data and the theoretical form, with no significant adjustable parameters, independently leads to similar conclusions. |
| Published Version: | doi:10.1103/PhysRevA.41.5687 |
| Terms of Use: | This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA |
| Citable link to this page: | http://nrs.harvard.edu/urn-3:HUL.InstRepos:8609120 |
This item appears in the following Collection(s)
-
FAS Scholarly Articles [5137]
Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University
Contact administrator regarding this item (to report mistakes or request changes)
