An Ice Lithography Instrument

DSpace/Manakin Repository

An Ice Lithography Instrument

Show simple item record

dc.contributor.author Han, Anpan
dc.contributor.author Chervinsky, John F.
dc.contributor.author Branton, Daniel
dc.contributor.author Golovchenko, Jene A.
dc.date.accessioned 2012-06-11T19:10:32Z
dc.date.issued 2011
dc.identifier.citation Han, Anpan, John Chervinsky, Daniel Branton and Jene A. Golovchenko. 2011. An ice lithography instrument. Review of Scientific Instruments 82(6): 065110. en_US
dc.identifier.isbn cryogenics, en_US
dc.identifier.issn 0034-6748 en_US
dc.identifier.issn 1089-7623 en_US
dc.identifier.uri http://nrs.harvard.edu/urn-3:HUL.InstRepos:8862126
dc.description.abstract We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice. To form a lift-off mask, ice is removed by the SEM electron beam (e-beam) guided by an e-beam lithography system. Without breaking vacuum, the sample with the ice mask is then transferred into a metal deposition chamber where metals are deposited by sputtering. The cold sample is then unloaded from the vacuum system and immersed in isopropanol at room temperature. As the ice melts, metal deposited on the ice disperses while the metals deposited on the sample where the ice had been removed by the e-beam remains. The instrument combines a high beam-current thermal field emission SEM fitted with an e-beam lithography system, cryogenic systems, and a high vacuum metal deposition system in a design that optimizes ice lithography for high throughput nanodevice fabrication. The nanoscale capability of the instrument is demonstrated with the fabrication of nanoscale metal lines. en_US
dc.description.sponsorship Engineering and Applied Sciences en_US
dc.description.sponsorship Molecular and Cellular Biology en_US
dc.description.sponsorship Physics en_US
dc.language.iso en_US en_US
dc.publisher American Institute of Physics en_US
dc.relation.isversionof doi:10.1063/1.3601005 en_US
dash.license OAP
dc.subject cryogenics en_US
dc.subject electron beam lithography en_US
dc.subject nanolithography en_US
dc.subject nanopatterning en_US
dc.subject scanning electron microscopy en_US
dc.subject sputter deposition en_US
dc.title An Ice Lithography Instrument en_US
dc.type Journal Article en_US
dc.description.version Accepted Manuscript en_US
dc.relation.journal Review of Scientific Instruments en_US
dash.depositing.author Golovchenko, Jene A.
dc.date.available 2012-06-11T19:10:32Z

Files in this item

Files Size Format View
Han_IceLithography.pdf 409.7Kb PDF View/Open

This item appears in the following Collection(s)

  • FAS Scholarly Articles [7175]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

Show simple item record

 
 

Search DASH


Advanced Search
 
 

Submitters