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dc.contributor.author	Han, Anpan
dc.contributor.author	Chervinsky, John F.
dc.contributor.author	Branton, Daniel
dc.contributor.author	Golovchenko, Jene A.
dc.date.accessioned	2012-06-11T19:10:32Z
dc.date.issued	2011
dc.identifier.citation	Han, Anpan, John Chervinsky, Daniel Branton and Jene A. Golovchenko. 2011. An ice lithography instrument. Review of Scientific Instruments 82(6): 065110.	en_US
dc.identifier.isbn	cryogenics,	en_US
dc.identifier.issn	0034-6748	en_US
dc.identifier.issn	1089-7623	en_US
dc.identifier.uri	http://nrs.harvard.edu/urn-3:HUL.InstRepos:8862126
dc.description.abstract	We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice. To form a lift-off mask, ice is removed by the SEM electron beam (e-beam) guided by an e-beam lithography system. Without breaking vacuum, the sample with the ice mask is then transferred into a metal deposition chamber where metals are deposited by sputtering. The cold sample is then unloaded from the vacuum system and immersed in isopropanol at room temperature. As the ice melts, metal deposited on the ice disperses while the metals deposited on the sample where the ice had been removed by the e-beam remains. The instrument combines a high beam-current thermal field emission SEM fitted with an e-beam lithography system, cryogenic systems, and a high vacuum metal deposition system in a design that optimizes ice lithography for high throughput nanodevice fabrication. The nanoscale capability of the instrument is demonstrated with the fabrication of nanoscale metal lines.	en_US
dc.description.sponsorship	Engineering and Applied Sciences	en_US
dc.description.sponsorship	Molecular and Cellular Biology	en_US
dc.description.sponsorship	Physics	en_US
dc.language.iso	en_US	en_US
dc.publisher	American Institute of Physics	en_US
dc.relation.isversionof	doi:10.1063/1.3601005	en_US
dash.license	OAP
dc.subject	cryogenics	en_US
dc.subject	electron beam lithography	en_US
dc.subject	nanolithography	en_US
dc.subject	nanopatterning	en_US
dc.subject	scanning electron microscopy	en_US
dc.subject	sputter deposition	en_US
dc.title	An Ice Lithography Instrument	en_US
dc.type	Journal Article	en_US
dc.description.version	Accepted Manuscript	en_US
dc.relation.journal	Review of Scientific Instruments	en_US
dash.depositing.author	Golovchenko, Jene A.
dc.date.available	2012-06-11T19:10:32Z

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  Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

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