Nanopatterning on Nonplanar and Fragile Substrates with Ice Resists

Nanopatterning on Nonplanar and Fragile Substrates with Ice Resists

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Nanopatterning on Nonplanar and Fragile Substrates with Ice Resists

dc.contributor.author	Han, Anpan
dc.contributor.author	Kuan, Aaron Tzeyang
dc.contributor.author	Golovchenko, Jene A.
dc.contributor.author	Branton, Daniel
dc.date.accessioned	2012-06-19T16:03:51Z
dc.date.issued	2012
dc.identifier.citation	Han, Anpan, Aaron Kuan, Jene Golovchenko, and Daniel Branton. 2012. Nanopatterning on nonplanar and fragile substrates with ice resists. Nano Letters 12(2): 1018-2021.	en_US
dc.identifier.issn	1530-6984	en_US
dc.identifier.issn	1530-6992	en_US
dc.identifier.uri	http://nrs.harvard.edu/urn-3:HUL.InstRepos:8895185
dc.description.abstract	Electron beam (e-beam) lithography using polymer resists is an important technology that provides the spatial resolution needed for nanodevice fabrication. But it is often desirable to pattern nonplanar structures on which polymeric resists cannot be reliably applied. Furthermore, fragile substrates, such as free-standing nanotubes or thin films, cannot tolerate the vigorous mechanical scrubbing procedures required to remove all residual traces of the polymer resist. Here we demonstrate several examples where e-beam lithography using an amorphous ice resist eliminates both of these difficulties and enables the fabrication of unique nanoscale device structures in a process we call ice lithography. We demonstrate the fabrication of micro- and nanostructures on the tip of atomic force microscope probes, microcantilevers, transmission electron microscopy grids, and suspended single-walled carbon nanotubes. Our results show that by using amorphous water ice as an e-beam resist, a new generation of nanodevice structures can be fabricated on nonplanar or fragile substrates.	en_US
dc.description.sponsorship	Engineering and Applied Sciences	en_US
dc.description.sponsorship	Molecular and Cellular Biology	en_US
dc.description.sponsorship	Physics	en_US
dc.language.iso	en_US	en_US
dc.publisher	American Chemical Society	en_US
dc.relation.isversionof	doi:10.1021/nl204198w	en_US
dc.relation.hasversion	http://www.ncbi.nlm.nih.gov/pubmed/22229744	en_US
dash.license	OAP
dc.subject	nonplanar	en_US
dc.subject	nanopatterning	en_US
dc.subject	e-beam lithography	en_US
dc.subject	ice lithography	en_US
dc.subject	resists	en_US
dc.title	Nanopatterning on Nonplanar and Fragile Substrates with Ice Resists	en_US
dc.type	Journal Article	en_US
dc.description.version	Accepted Manuscript	en_US
dc.relation.journal	Nano Letters	en_US
dash.depositing.author	Golovchenko, Jene A.
dc.date.available	2012-06-19T16:03:51Z