Nanopatterning on Nonplanar and Fragile Substrates with Ice Resists

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Nanopatterning on Nonplanar and Fragile Substrates with Ice Resists

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dc.contributor.author Han, Anpan
dc.contributor.author Kuan, Aaron Tzeyang
dc.contributor.author Golovchenko, Jene A.
dc.contributor.author Branton, Daniel
dc.date.accessioned 2012-06-19T16:03:51Z
dc.date.issued 2012
dc.identifier.citation Han, Anpan, Aaron Kuan, Jene Golovchenko, and Daniel Branton. 2012. Nanopatterning on nonplanar and fragile substrates with ice resists. Nano Letters 12(2): 1018-2021. en_US
dc.identifier.issn 1530-6984 en_US
dc.identifier.issn 1530-6992 en_US
dc.identifier.uri http://nrs.harvard.edu/urn-3:HUL.InstRepos:8895185
dc.description.abstract Electron beam (e-beam) lithography using polymer resists is an important technology that provides the spatial resolution needed for nanodevice fabrication. But it is often desirable to pattern nonplanar structures on which polymeric resists cannot be reliably applied. Furthermore, fragile substrates, such as free-standing nanotubes or thin films, cannot tolerate the vigorous mechanical scrubbing procedures required to remove all residual traces of the polymer resist. Here we demonstrate several examples where e-beam lithography using an amorphous ice resist eliminates both of these difficulties and enables the fabrication of unique nanoscale device structures in a process we call ice lithography. We demonstrate the fabrication of micro- and nanostructures on the tip of atomic force microscope probes, microcantilevers, transmission electron microscopy grids, and suspended single-walled carbon nanotubes. Our results show that by using amorphous water ice as an e-beam resist, a new generation of nanodevice structures can be fabricated on nonplanar or fragile substrates. en_US
dc.description.sponsorship Engineering and Applied Sciences en_US
dc.description.sponsorship Molecular and Cellular Biology en_US
dc.description.sponsorship Physics en_US
dc.language.iso en_US en_US
dc.publisher American Chemical Society en_US
dc.relation.isversionof doi:10.1021/nl204198w en_US
dc.relation.hasversion http://www.ncbi.nlm.nih.gov/pubmed/22229744 en_US
dash.license OAP
dc.subject nonplanar en_US
dc.subject nanopatterning en_US
dc.subject e-beam lithography en_US
dc.subject ice lithography en_US
dc.subject resists en_US
dc.title Nanopatterning on Nonplanar and Fragile Substrates with Ice Resists en_US
dc.type Journal Article en_US
dc.description.version Accepted Manuscript en_US
dc.relation.journal Nano Letters en_US
dash.depositing.author Golovchenko, Jene A.
dc.date.available 2012-06-19T16:03:51Z

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  • FAS Scholarly Articles [6948]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

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