Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes

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Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes

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Title: Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes
Author: Ma, Qiang; Gordon, Roy Gerald; Zaera, Francisco

Note: Order does not necessarily reflect citation order of authors.

Citation: Ma, Qiang, Roy G. Gordon and Francisco Zaera. 2011. Surface chemistry of copper precursors in connection with atomic layer deposition (ALD) processes. Paper presented at The 11th International Conference on Atomic Layer Deposition, Cambridge, MA, June 26-29, 2011.
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Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:9639953

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  • FAS Scholarly Articles [7594]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University
 
 

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