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Title:	Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes
Author:	Ma, Qiang; Gordon, Roy Gerald; Zaera, Francisco Note: Order does not necessarily reflect citation order of authors.
Citation:	Ma, Qiang, Roy G. Gordon and Francisco Zaera. 2011. Surface chemistry of copper precursors in connection with atomic layer deposition (ALD) processes. Paper presented at The 11th International Conference on Atomic Layer Deposition, Cambridge, MA, June 26-29, 2011.
Full Text & Related Files:	Ma_SurfaceChemistry.pdf (1.562Mb; PDF)
Terms of Use:	This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA
Citable link to this page:	http://nrs.harvard.edu/urn-3:HUL.InstRepos:9639953

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  Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

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