Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes

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Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes

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dc.contributor.author Ma, Qiang
dc.contributor.author Gordon, Roy Gerald
dc.contributor.author Zaera, Francisco
dc.date.accessioned 2012-09-25T18:20:08Z
dc.date.issued 2011
dc.identifier.citation Ma, Qiang, Roy G. Gordon and Francisco Zaera. 2011. Surface chemistry of copper precursors in connection with atomic layer deposition (ALD) processes. Paper presented at The 11th International Conference on Atomic Layer Deposition, Cambridge, MA, June 26-29, 2011. en_US
dc.identifier.uri http://nrs.harvard.edu/urn-3:HUL.InstRepos:9639953
dc.description.sponsorship Chemistry and Chemical Biology en_US
dc.language.iso en_US en_US
dash.license LAA
dc.title Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes en_US
dc.type Conference Paper en_US
dc.description.version Author's Original en_US
dash.depositing.author Gordon, Roy Gerald
dc.date.available 2012-09-25T18:20:08Z

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  • FAS Scholarly Articles [7594]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

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