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dc.contributor.author	Sinsermsuksakul, Prasert
dc.contributor.author	Heo, Jaeyeong
dc.contributor.author	Gordon, Roy Gerald
dc.date.accessioned	2012-09-26T12:39:56Z
dc.date.issued	2011
dc.identifier.citation	Sinsermsuksakul, Prasert, Jaeyeong Heo, and Roy G. Gordon. 2011. Atomic layer deposition and chemical vapor deposition of tin(II) sulfide. Paper presented at The 11th International Conference on Atomic Layer Deposition, Cambridge, MA, June 26-29, 2011.	en_US
dc.identifier.uri	http://nrs.harvard.edu/urn-3:HUL.InstRepos:9639971
dc.description.sponsorship	Chemistry and Chemical Biology	en_US
dc.language.iso	en_US	en_US
dash.license	LAA
dc.title	Atomic Layer Deposition of Tin(II) Sulfide	en_US
dc.type	Conference Paper	en_US
dc.description.version	Author's Original	en_US
dash.depositing.author	Gordon, Roy Gerald
dc.date.available	2012-09-26T12:39:56Z

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  Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

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