Atomic Layer Deposition of Tin(II) Sulfide

DSpace/Manakin Repository

Atomic Layer Deposition of Tin(II) Sulfide

Show simple item record

dc.contributor.author Sinsermsuksakul, Prasert
dc.contributor.author Heo, Jaeyeong
dc.contributor.author Gordon, Roy Gerald
dc.date.accessioned 2012-09-26T12:39:56Z
dc.date.issued 2011
dc.identifier.citation Sinsermsuksakul, Prasert, Jaeyeong Heo, and Roy G. Gordon. 2011. Atomic layer deposition and chemical vapor deposition of tin(II) sulfide. Paper presented at The 11th International Conference on Atomic Layer Deposition, Cambridge, MA, June 26-29, 2011. en_US
dc.identifier.uri http://nrs.harvard.edu/urn-3:HUL.InstRepos:9639971
dc.description.sponsorship Chemistry and Chemical Biology en_US
dc.language.iso en_US en_US
dash.license LAA
dc.title Atomic Layer Deposition of Tin(II) Sulfide en_US
dc.type Conference Paper en_US
dc.description.version Author's Original en_US
dash.depositing.author Gordon, Roy Gerald
dc.date.available 2012-09-26T12:39:56Z

Files in this item

Files Size Format View
Sinsermsuksakul_AtomicLayer.pdf 1.908Mb PDF View/Open

This item appears in the following Collection(s)

  • FAS Scholarly Articles [6463]
    Peer reviewed scholarly articles from the Faculty of Arts and Sciences of Harvard University

Show simple item record

 
 

Search DASH


Advanced Search
 
 

Submitters