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    • Atomic layer deposition of Al-incorporated Zn(O,S) thin films with tunable electrical properties 

      Park, Helen Hejin; Jayaraman, Ashwin N Kr; Heasley, Rachel Lenox; Yang, Chuanxi; Hartle, Lauren Ann; Mankad, Ravin; Haight, Richard; Mitzi, David B.; Gunawan, Oki; Gordon, Roy Gerald (AIP Publishing, 2014)
      Zinc oxysulfide, Zn(O,S), films grown by atomic layer deposition were incorporated with aluminum to adjust the carrier concentration. The electron carrier concentration increased up to one order of magnitude from 1019 to ...