Browsing by Author "Liu, Yiqun"
Now showing items 1-3 of 3
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Chemical Vapor Deposition (CVD) of Manganese Self-Aligned Diffusion Barriers for Cu Interconnections in Microelectronics
Gordon, Roy Gerald; Kim, Hoon; Au, Yeung Billy; Wang, Hongtao; Bhandari, Harish B; Liu, Yiqun; Lee, Don K; Lin, Youbo (Materials Research Society, 2009)Barriers to prevent diffusion of copper, oxygen and water vapor were formed by CVD using a manganese precursor vapor that reacts with silica surfaces. The manganese metal penetrates only a few nanometers into the silica ... -
Effects of Low Temperature O2 Treatment on the Electrical Characteristics of Amorphous LaAlO3 Films by Atomic Layer Deposition
Liu, Yiqun; Kim, Hoon; Wang, Jun-Jieh; Li, Huazhi; Gordon, Roy Gerald (Electrochemical Society, 2008)Amorphous LaAlO3 films were deposited on hydrogen-terminated silicon substrates by atomic layer deposition (ALD) at 300 oC. The precursors were lanthanum tris(N,N'-diisopropylformamidinate), trimethylaluminum (TMA) and ... -
Frequency response of LaAlO3/SrTiO3 all-oxide field-effect transistors
Liu, Qingmin; Dong, Lin; Liu, Yiqun; Gordon, Roy Gerald; Ye, Peide D.; Fay, Patrick; Seabaugh, Alan (Elsevier BV, 2012)The frequency response of all oxide field-effect transistors with amorphous LaAlO3 on a crystalline SrTiO3 substrate is reported. The intrinsic cut-off frequencies of 4 μm gate-length devices are found to be approximately ...