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    • Quantitative Evaluation of Cobalt Disilicide/Si Interfacial Roughness 

      Yang, Jing; Feng, Jun; Li, Kecheng; Bhandari, Harish; Li, Zhefeng; Gordon, Roy Gerald (The Electrochemical Society, 2017)
      The formation of smooth, conformal cobalt disilicide (CoSi2) without facets or voids is critical for microelectronic device reliability owing to the ultra-shallow contact areas. Here we demonstrate the formation of smooth ...