Liquid-Vapor Density Profile of Helium: An X-Ray Study

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Liquid-Vapor Density Profile of Helium: An X-Ray Study

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Title: Liquid-Vapor Density Profile of Helium: An X-Ray Study
Author: Lurio, L. B.; Rabedeau, T. A.; Pershan, Peter S.; Silvera, Isaac F.; Deutsch, M.; Kosowsky, S. D.; Ocko, B. M.

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Citation: Lurio, L. B., T. A. Rabedeau, Peter S. Pershan, Isaac F. Silvera, M. Deutsch, S. D. Kosowsky, and B. M. Ocko. 1992. Liquid-vapor density profile of helium: An x-ray study. Physical Review Letters 68(17): 2628-2631.
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Abstract: The average liquid-vapor density profiles 〈ρ(z)〉 of thick \(^4\)He films adsorbed onto a silicon substrate were measured using x-ray reflectivity. The results are well represented by a 90%-10% interfacial width of 9.2\(\pm\)1 Å at 1.13 K which extrapolates to a T=0 K, 90%-10% interfacial width of 7.6\(\pm^{1}_{2}\) Å. The sensitivity of the measurement to the width, shape, and asymmetry of the density profile is discussed.
Published Version: doi:10.1103/PhysRevLett.68.2628
Other Sources: http://www.utwente.nl/tnw/pcf/education/jmbc_course_on_capillarity_dri/Articles/anton_darhuber/surface_tension_etc/Lurio_PRL92_liq_vap_density_profile_Helium.pdf
Terms of Use: This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:10357544
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