# Complete Wetting of a Rough Surface: An X-Ray Study

 Title: Complete Wetting of a Rough Surface: An X-Ray Study Author: Tidswell, I. M.; Rabedeau, T. A.; Pershan, Peter S.; Kosowsky, S. D. Note: Order does not necessarily reflect citation order of authors. Citation: Tidswell, I. M., T. A. Rabedeau, Peter S. Pershan, and S. D. Kosowsky. 1991. Complete wetting of a rough surface: An x-ray study. Physical Review Letters 66(16): 2108-2111. Access Status: Full text of the requested work is not available in DASH at this time (“dark deposit”). For more information on dark deposits, see our FAQ. Full Text & Related Files: Tidswell_Complete.pdf (655.7Kb; PDF) Abstract: The evolution of the surface structure of a wetting film on a rough surface as a function of the film thickness has been studied by x-ray specular reflection and surface diffusion scattering. For thin films ($$\lesssim$$60 Å) the liquid surface is characterized by static undulations induced by the roughness of the substrate; however, with increasing film thickness the structure is dominated by thermally induced capillary waves. The data are quantitatively described by a model with exclusively van der Waals liquid-substrate interactions. Published Version: doi:10.1103/PhysRevLett.66.2108 Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:10357546 Downloads of this work: