Complete Wetting of a Rough Surface: An X-Ray Study
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Tidswell, I. M.
Rabedeau, T. A.
Kosowsky, S. D.
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CitationTidswell, I. M., T. A. Rabedeau, Peter S. Pershan, and S. D. Kosowsky. 1991. Complete wetting of a rough surface: An x-ray study. Physical Review Letters 66(16): 2108-2111.
AbstractThe evolution of the surface structure of a wetting film on a rough surface as a function of the film thickness has been studied by x-ray specular reflection and surface diffusion scattering. For thin films (\(\lesssim\)60 Å) the liquid surface is characterized by static undulations induced by the roughness of the substrate; however, with increasing film thickness the structure is dominated by thermally induced capillary waves. The data are quantitatively described by a model with exclusively van der Waals liquid-substrate interactions.
Citable link to this pagehttp://nrs.harvard.edu/urn-3:HUL.InstRepos:10357546
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