Time-resolved measurements of nanoscale surface pattern formation kinetics in two dimensions on ion-irradiated Si

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Time-resolved measurements of nanoscale surface pattern formation kinetics in two dimensions on ion-irradiated Si

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Title: Time-resolved measurements of nanoscale surface pattern formation kinetics in two dimensions on ion-irradiated Si
Author: Anzenberg, Eitan; Madi, Charbel S.; Aziz, Michael J.; Ludwig, Karl F. Jr.

Note: Order does not necessarily reflect citation order of authors.

Citation: Anzenberg, Eitan, Charbel S. Madi, Michael J. Aziz, and Karl F. Ludwig Jr. 2011. “Time-Resolved Measurements of Nanoscale Surface Pattern Formation Kinetics in Two Dimensions on Ion-Irradiated Si.” Physics Review B 84, no. 21: 214108.
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Abstract: The nanoscale kinetics of surface topography evolution on silicon surfaces irradiated with 1 keV Ar+ ions is examined in both directions perpendicular and parallel to the projection of the ion beam on the surface. We use grazing incidence small angle x-ray scattering to measure in situ the evolution of surface morphology via the linear dispersion relation. We study the transition from surface ultra-smoothening at low angles of deviation from normal ion incidence to a pattern-forming instability at high incidence angles. A model based on the effects of impact-induced redistribution of those atoms that are not sputtered away explains both the observed ultra-smoothening at low angles from normal ion incidence and the instability at higher angles and accounts quantitatively for the measured two-dimensional dispersion relation and its dependence on incidence angle.
Published Version: doi:10.1103/PhysRevB.84.214108
Terms of Use: This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:12748665
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