Thermal (Kapitza) resistance of interfaces in compositional dependent \(ZnO-In_2O_3\) superlattices

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Thermal (Kapitza) resistance of interfaces in compositional dependent \(ZnO-In_2O_3\) superlattices

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Title: Thermal (Kapitza) resistance of interfaces in compositional dependent \(ZnO-In_2O_3\) superlattices
Author: Liang, Xin; Baram, Mor; Clarke, David R.

Note: Order does not necessarily reflect citation order of authors.

Citation: Liang, Xin, Mor Baram, and David R. Clarke. 2013. “Thermal (Kapitza) Resistance of Interfaces in Compositional Dependent \(ZnO-In_2O_3\) Superlattices.” Appl. Phys. Lett. 102 (22): 223903. doi:10.1063/1.4809784.
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Abstract: Compositionally dependent superlattices, \(In_2O_3\) \((ZnO) _k\), form in the \(ZnO\)-rich portion of the \(ZnO-In_2O_3\) phase diagram, decreasing thermal conductivity and altering both the electron conductivity and Seebeck coefficient over a wide range of composition and temperature. With increasing indium concentration, isolated point defects first form in \(ZnO\) and then superlattice structures with decreasing interface spacing evolve. By fitting the temperature and indium concentration dependence of the thermal conductivity to the Klemens-Callaway model, incorporating interface scattering and accounting for conductivity anisotropy, the Kapitza resistance due to the superlattice interfaces is found to be \(5.0 ± 0.6 × 10^{−10} m^2K/W\). This finding suggests that selecting oxides with a compositionally dependent superlattice structure can be a viable approach, unaffected by grain growth, to maintaining low thermal conductivity at high temperatures.
Published Version: doi:10.1063/1.4809784
Other Sources: http://clarke.seas.harvard.edu/sites/default/files/Liang%20Kapitza%20Resistance%20ZnO-In2O3%20SL%20APL%202013.pdf
Terms of Use: This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:13366712
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