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dc.contributor.authorZhang, Jingyun
dc.contributor.authorLou, Xiabing
dc.contributor.authorSi, Mengwei
dc.contributor.authorWu, Heng
dc.contributor.authorShao, Jiayi
dc.contributor.authorManfra, Michael J.
dc.contributor.authorGordon, Roy Gerald
dc.contributor.authorYe, Peide D.
dc.date.accessioned2015-03-10T21:06:54Z
dc.date.issued2015
dc.identifierQuick submit: 2015-02-24T10:33:41-05:00
dc.identifier.citationZhang, Jingyun, Xiabing Lou, Mengwei Si, Heng Wu, Jiayi Shao, Michael J. Manfra, Roy G. Gordon, and Peide D. Ye. 2015. “Inversion-Mode GaAs Wave-Shaped Field-Effect Transistor on GaAs (100) Substrate.” Appl. Phys. Lett. 106 (7) (February 16): 073506. Portico. doi:10.1063/1.4913431.en_US
dc.identifier.issn0003-6951en_US
dc.identifier.issn1077-3118en_US
dc.identifier.urihttp://nrs.harvard.edu/urn-3:HUL.InstRepos:14117006
dc.description.abstractInversion-mode GaAs wave-shaped metal-oxide-semiconductor field-effect transistors (WaveFETs) are demonstrated using atomic-layer epitaxy of La2O3 as gate dielectric on (111)A nano-facets formed on a GaAs (100) substrate. The wave-shaped nano-facets, which are desirable for the device on-state and off-state performance, are realized by lithographic patterning and anisotropic wet etching with optimized geometry. A well-behaved 1 μm gate length GaAs WaveFET shows a maximum drain current of 64 mA/mm, a subthreshold swing of 135 mV/dec, and an ION/IOFF ratio of greater than 107.en_US
dc.description.sponsorshipChemistry and Chemical Biologyen_US
dc.language.isoen_USen_US
dc.publisherAIP Publishingen_US
dc.relation.isversionofdoi:10.1063/1.4913431en_US
dc.relation.hasversionhttp://faculty.chemistry.harvard.edu/files/gordon/files/apl_wavefet_jingyun_2015.pdfen_US
dash.licenseOAP
dc.titleInversion-mode GaAs wave-shaped field-effect transistor on GaAs (100) substrateen_US
dc.typeJournal Articleen_US
dc.date.updated2015-02-24T15:33:43Z
dc.description.versionAccepted Manuscripten_US
dc.rights.holderZhang, Jianyun; Lou, Xiabing; Si, Mengwei; Wu, Heng; Shao, Jiayi; Manfra, Michael J.; Gordon, Roy G.; Ye, Peide Y.
dc.relation.journalApplied Physics Lettersen_US
dash.depositing.authorGordon, Roy Gerald
dc.date.available2015-03-10T21:06:54Z
dc.identifier.doi10.1063/1.4913431*
dash.contributor.affiliatedLou, Xiabing
dash.contributor.affiliatedGordon, Roy


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