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    • Nanopatterning on Nonplanar and Fragile Substrates with Ice Resists 

      Han, Anpan; Kuan, Aaron Tzeyang; Golovchenko, Jene A.; Branton, Daniel (American Chemical Society, 2012)
      Electron beam (e-beam) lithography using polymer resists is an important technology that provides the spatial resolution needed for nanodevice fabrication. But it is often desirable to pattern nonplanar structures on which ...