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dc.contributor.authorLee, Dongwoo
dc.contributor.authorSim, Gi-Dong
dc.contributor.authorXiao, Kechao
dc.contributor.authorVlassak, Joost J.
dc.date.accessioned2015-09-02T19:07:10Z
dc.date.issued2014
dc.identifierQuick submit: 2015-08-28T14:51:29-04:00
dc.identifier.citationLee, Dongwoo, Gi-Dong Sim, Kechao Xiao, and Joost J. Vlassak. 2014. “ Low-Temperature Synthesis of Ultra-High-Temperature Coatings of ZrB 2 Using Reactive Multilayers .” The Journal of Physical Chemistry C 118 (36) (September 11): 21192–21198. doi:10.1021/jp505941g.en_US
dc.identifier.issn1932-7447en_US
dc.identifier.urihttp://nrs.harvard.edu/urn-3:HUL.InstRepos:22063068
dc.description.abstractWe demonstrate a route to synthesize ultra-high-temperature ceramic coatings of ZrB2 at temperatures below 1300 K using Zr/B reactive multilayers. Highly textured crystalline ZrB2 is formed at modest temperatures because of the absence of any oxide at the interface between Zr and B and the very short diffusion distance that is inherent to the multilayer geometry. The kinetics of the ZrB2 formation reaction is analyzed using high-temperature scanning nanocalorimetry, and the microstructural evolution of the multilayer is revealed using transmission electron microscopy. We show that the Zr/B reaction proceeds in two stages: (1) interdiffusion between the nanocrystalline Zr and the amorphous B layers, forming an amorphous Zr/B alloy, and (2) crystallization of the amorphous alloy to form ZrB2. Scanning nanocalorimetry measurements performed at heating rates ranging from 3100 to 10000 K/s allow determination of the kinetic parameters of the multilayer reaction, yielding activation energies of 0.47 and 2.4 eV for Zr/B interdiffusion and ZrB2 crystallization, respectively.en_US
dc.description.sponsorshipEngineering and Applied Sciencesen_US
dc.language.isoen_USen_US
dc.publisherAmerican Chemical Society (ACS)en_US
dc.relation.isversionofdoi:10.1021/jp505941gen_US
dash.licenseOAP
dc.titleLow-Temperature Synthesis of Ultra-High-Temperature Coatings of ZrB 2 Using Reactive Multilayersen_US
dc.typeJournal Articleen_US
dc.date.updated2015-08-28T18:51:30Z
dc.description.versionAccepted Manuscripten_US
dc.rights.holderD Lee, GD Sim, K Xiao, JJ Vlassak
dc.relation.journalThe Journal of Physical Chemistry Cen_US
dash.depositing.authorVlassak, Joost J.
dc.date.available2015-09-02T19:07:10Z
dc.identifier.doi10.1021/jp505941g*
dash.contributor.affiliatedLee, Dongwoo
dash.contributor.affiliatedVlassak, Joost


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