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dc.contributor.authorXiao, Kechao
dc.contributor.authorVlassak, Joost J.
dc.date.accessioned2015-09-02T19:23:46Z
dc.date.issued2015
dc.identifierQuick submit: 2015-08-28T14:46:51-04:00
dc.identifier.citationXiao, Kechao, and Joost J. Vlassak. 2015. “Nucleation Behavior of Melted Bi Films at Cooling Rates from 101 to 104K/s Studied by Combining Scanning AC and DC Nano-Calorimetry Techniques.” Thermochimica Acta 603 (March): 29–38. doi:10.1016/j.tca.2014.05.006.en_US
dc.identifier.issn0040-6031en_US
dc.identifier.urihttp://nrs.harvard.edu/urn-3:HUL.InstRepos:22068310
dc.description.abstractWe study the nucleation behavior of undercooled liquid Bi at cooling rates ranging from 101 to 104 K/s using a combination of scanning DC and AC nano-calorimetry techniques. Upon initial melting, the Bi thin-film sample breaks up into silicon nitride-coated isolated islands. The number of islands in a typical sample is sufficiently large that highly repeatable nucleation behavior is observed, despite the stochastic nature of the nucleation process. We establish a data reduction technique to evaluate the nucleation rate from DC and AC calorimetry results. The results show that the driving force for the nucleation of melted Bi is well described by classical nucleation theory over a wide range of cooling rates. The proposed technique provides a unique and efficient way to examine nucleation kinetics with cooling rates over several orders of magnitude. The technique is quite general and can be used to evaluate reaction kinetics in other materials.en_US
dc.description.sponsorshipEngineering and Applied Sciencesen_US
dc.language.isoen_USen_US
dc.publisherElsevier BVen_US
dc.relation.isversionofdoi:10.1016/j.tca.2014.05.006en_US
dash.licenseOAP
dc.subjectCrystal nucleationen_US
dc.subjectNano-calorimetryen_US
dc.subjectAC calorimetryen_US
dc.titleNucleation behavior of melted Bi films at cooling rates from 101 to 104K/s studied by combining scanning AC and DC nano-calorimetry techniquesen_US
dc.typeJournal Articleen_US
dc.date.updated2015-08-28T18:46:52Z
dc.description.versionAccepted Manuscripten_US
dc.rights.holderK Xiao, JJ Vlassak
dc.relation.journalThermochimica Actaen_US
dash.depositing.authorVlassak, Joost J.
dc.date.available2015-09-02T19:23:46Z
dc.identifier.doi10.1016/j.tca.2014.05.006*
dash.contributor.affiliatedVlassak, Joost


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