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dc.contributor.authorSim, Gi-dong
dc.contributor.authorVlassak, Joost J.
dc.date.accessioned2015-09-02T19:28:08Z
dc.date.issued2014
dc.identifierQuick submit: 2015-08-28T14:48:10-04:00
dc.identifier.citationSim, Gi-Dong, and Joost J. Vlassak. 2014. “High-Temperature Tensile Behavior of Freestanding Au Thin Films.” Scripta Materialia 75 (March): 34–37. doi:10.1016/j.scriptamat.2013.11.011.en_US
dc.identifier.issn1359-6462en_US
dc.identifier.urihttp://nrs.harvard.edu/urn-3:HUL.InstRepos:22070871
dc.description.abstractThe mechanical behavior of freestanding thin sputter-deposited films of Au is studied at temperatures up to 340 °C, using tensile testing. Films tested at elevated temperatures exhibit a significant decrease in flow stress and stiffness. Furthermore, the flow stress decreases with decreasing film thickness, contravening the usual notion that “smaller is stronger”. This behavior is attributed mainly to diffusion-facilitated grain boundary sliding.en_US
dc.description.sponsorshipEngineering and Applied Sciencesen_US
dc.language.isoen_USen_US
dc.publisherElsevier BVen_US
dc.relation.isversionofdoi:10.1016/j.scriptamat.2013.11.011en_US
dc.relation.hasversionhttp://imechanica.org/files/High%20temperature%20tensile%20behavior%20of%20free-standing%20Au%20thin%20films.pdfen_US
dash.licenseOAP
dc.subjectIn situ tensile testen_US
dc.subjectHigh-temperature deformationen_US
dc.subjectThin filmsen_US
dc.subjectGrain boundary slidingen_US
dc.subjectCreepen_US
dc.titleHigh-temperature tensile behavior of freestanding Au thin filmsen_US
dc.typeJournal Articleen_US
dc.date.updated2015-08-28T18:48:11Z
dc.description.versionAccepted Manuscripten_US
dc.rights.holderGD Sim, JJ Vlassak
dc.relation.journalScripta Materialiaen_US
dash.depositing.authorVlassak, Joost J.
dc.date.available2015-09-02T19:28:08Z
dash.funder.nameAir Force Office of Scientific Researchen_US
dash.funder.nameNational Science Foundationen_US
dash.funder.awardFA9550-12-1-0098en_US
dash.funder.awardECS-0335765en_US
dc.identifier.doi10.1016/j.scriptamat.2013.11.011*
dash.contributor.affiliatedSim, Gi-dong
dash.contributor.affiliatedVlassak, Joost


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