Strain-Stabilized Solid Phase Epitaxy of Si–Ge on Si.

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Strain-Stabilized Solid Phase Epitaxy of Si–Ge on Si.

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Title: Strain-Stabilized Solid Phase Epitaxy of Si–Ge on Si.
Author: Aziz, Michael; Sage, Jennifer F.; Barvosa-Carter, William

Note: Order does not necessarily reflect citation order of authors.

Citation: Sage, Jennifer F., William Barvosa-Carter, and Michael J. Aziz. 2006. Strain-stabilized solid phase epitaxy of Si–Ge on Si. Journal of Applied Physics 99(11): 113529.
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Abstract: We compare solid phase epitaxial growth of amorphous Si–Ge alloys created by Ge ion implantation into Si with and without the imposition of 0.5 GPa of externally applied biaxial tensile stress. External loading stabilizes the growth front against roughening, resulting in a doubling of the maximum reported Ge concentration for stable growth to 14 at. %. The externally applied stress appears to superpose with the intrinsic compositional stress and indicates a threshold of approximately 0.6 GPa for interface breakdown. This principle is expected to be applicable to expanding the composition range for stable growth of other semiconductor alloy combinations by other growth techniques.
Published Version: http://dx.doi.org/10.1063/1.2200448
Terms of Use: This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:2794934
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