Film Growth Mechanisms in Pulsed Laser Deposition

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Film Growth Mechanisms in Pulsed Laser Deposition

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Title: Film Growth Mechanisms in Pulsed Laser Deposition
Author: Aziz, Michael
Citation: Aziz, Michael J. 2008. Film growth mechanisms in pulsed laser deposition. Applied Physics A: Materials Science & Processing 93(3): 579-587.
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Abstract: This paper reviews our recent studies of the fundamentals of growth morphology evolution in Pulsed Laser Deposition in two prototypical growth modes: metal on-insulator island growth and semiconductor homoepitaxy. By comparing morphology evolution for pulsed laser deposition and thermal deposition in the same dual-use chamber under identical thermal, background, and surface preparation conditions, and varying the kinetic energy by varying the laser fluence or using an inert background gas, we have isolated the effect of kinetic energy from that of flux pulsing in determining the differences between morphology evolution in these growth methods. In each growth mode analytical growth models and Kinetic Monte Carlo simulations for thermal deposition, modified to include kinetic energy effects, are successful at explaining much of what we observe experimentally.
Published Version: http://dx.doi.org/10.1007/s00339-008-4696-7
Terms of Use: This article is made available under the terms and conditions applicable to Open Access Policy Articles, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#OAP
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:2795447
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