Dynamics of Pattern Formation During Low-Energy Ion Bombardment of Si(0 0 1)
Chason et al_2001.pdf (255.8Kb)
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Floro, Jerry A.
Sinclair, Michael B.
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CitationChason, Eric, Jonah Erlebacher, Michael J. Aziz, Jerry A. Floro, and Michael B. Sinclair. 2001. Dynamics of pattern formation during low-energy ion bombardment of Si(0 0 1). Nuclear Instruments and Methods in Physics Research B 178(1-4): 55-61.
AbstractSputtering of surfaces by collimated, low-energy ion beams results in spontaneous pattern formation in many systems. In order to explore the mechanisms that control the pattern formation, we have used in situ light scattering to measure the evolution of sputtered Si(0 0 1) surfaces. The results are interpreted within a linear instability model originally proposed by R.M. Bradley and J.M.E. Harper [J. Vac. Sci. Technol. A 6 (1988) 2390] that includes the dependence of the sputter yield on the local surface morphology.
Citable link to this pagehttp://nrs.harvard.edu/urn-3:HUL.InstRepos:2796947
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