Ion Implantation and Annealing of SrTiO3 and CaTiO3
Boatner, L. A.
White, C. Woody
MetadataShow full item record
CitationAziz, Michael J., L. A. Boatner, J. Rankin, and C. W. White. 1987. Ion Implantation and Annealing of SrTiO3 and CaTiO3. Materials Research Society Symposium Proceedings 93: 9-13.
AbstractIon implantation damage and thermal annealing results are presented for single crystals of SrTiO3 and CaTiO3. The near-surface region of both of these materials can be made amorphous by low doses (~1015/cm2) of heavy ions (PB at 540 KeV). During annealing, the amorphous implanted region crystallizes epitaxially on the underlying single-crystal substrate. The kinetics of this solid-phase epitaxial recrystallization process have been measured by employing ion channeling techniques.
Citable link to this pagehttp://nrs.harvard.edu/urn-3:HUL.InstRepos:2839216
- FAS Scholarly Articles