Ion Implantation and Annealing of SrTiO3 and CaTiO3

Abstract

Ion implantation damage and thermal annealing results are presented for single crystals of SrTiO₃ and CaTiO₃. The near-surface region of both of these materials can be made amorphous by low doses (~10¹⁵/cm²) of heavy ions (PB at 540 KeV). During annealing, the amorphous implanted region crystallizes epitaxially on the underlying single-crystal substrate. The kinetics of this solid-phase epitaxial recrystallization process have been measured by employing ion channeling techniques.