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dc.contributor.authorMartinez, Robert
dc.contributor.authorAugustyniak, Walter
dc.contributor.authorGolovchenko, Jene Andrew
dc.date.accessioned2016-11-18T16:53:27Z
dc.date.issued1990
dc.identifier.citationMartinez, Robert, Walter Augustyniak, and Jene Golovchenko. 1990. Direct Measurement of Crystal Surface Stress. Physical Review Letters 64, no. 9: 1035–1038. doi:10.1103/physrevlett.64.1035.en_US
dc.identifier.issn0031-9007en_US
dc.identifier.urihttp://nrs.harvard.edu/urn-3:HUL.InstRepos:29407034
dc.description.abstractWe have measured surface stresses on clean Si(111) 7×7 by comparing this surface to a reference surface on which gallium atoms are adsorbed under UHV conditions. Stresses are determined by optically measuring the macroscopic strain induced in thin samples. We find a surface stress of 2.37 eV/(1×1 cell) for Si(111) 7×7, and a stress in the range 0.90–1.09 eV/(1×1 cell) for the Si(Ga) (111) superlattice associated with one monolayer Ga coverage. Comparison with theory suggests that our technique will be a powerful tool to measure equilibrium stresses in atomically clean surfaces.en_US
dc.description.sponsorshipPhysicsen_US
dc.language.isoen_USen_US
dc.publisherAmerican Physical Society (APS)en_US
dc.relation.isversionofdoi:10.1103/PhysRevLett.64.1035en_US
dc.relation.hasversionhttp://golovchenko.physics.harvard.edu/DirectMeasurementOfCrystalSurface.pdfen_US
dash.licenseLAA
dc.titleDirect measurement of crystal surface stressen_US
dc.typeJournal Articleen_US
dc.description.versionVersion of Recorden_US
dc.relation.journalPhys. Rev. Lett.en_US
dash.depositing.authorGolovchenko, Jene Andrew
dc.date.available2016-11-18T16:53:27Z
dc.identifier.doi10.1103/PhysRevLett.64.1035*
dash.contributor.affiliatedGolovchenko, Jene


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