Atomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanopores
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CitationChen, Peng, Toshiyuki Mitsui, Damon B. Farmer, Jene Golovchenko, Roy G. Gordon, and Daniel Branton. 2004. Atomic layer deposition to fine-tune the surface properties and diameters of fabricated nanopores. Nano Letters 4(7): 1333-1337.
AbstractAtomic layer deposition of alumina enhanced the molecule sensing characteristics of fabricated nanopores by fine-tuning their surface properties, reducing 1/f noise, neutralizing surface charge to favor capture of DNA and other negative polyelectrolytes, and controlling the diameter and aspect ratio of the pores with near single Ångstrom precision. The control over the chemical and physical nature of the pore surface provided by atomic layer deposition produced a higher yield of functional nanopore detectors.
Citable link to this pagehttp://nrs.harvard.edu/urn-3:HUL.InstRepos:3109363
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