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dc.contributor.authorChen, Peng
dc.contributor.authorMitsui, Toshiyuki
dc.contributor.authorFarmer, Damon B.
dc.contributor.authorGolovchenko, Jene
dc.contributor.authorGordon, Roy
dc.contributor.authorBranton, Daniel
dc.date.accessioned2009-06-16T18:52:59Z
dc.date.issued2004
dc.identifier.citationChen, Peng, Toshiyuki Mitsui, Damon B. Farmer, Jene Golovchenko, Roy G. Gordon, and Daniel Branton. 2004. Atomic layer deposition to fine-tune the surface properties and diameters of fabricated nanopores. Nano Letters 4(7): 1333-1337.en
dc.identifier.issn1530-6984en
dc.identifier.urihttp://nrs.harvard.edu/urn-3:HUL.InstRepos:3109363
dc.description.abstractAtomic layer deposition of alumina enhanced the molecule sensing characteristics of fabricated nanopores by fine-tuning their surface properties, reducing 1/f noise, neutralizing surface charge to favor capture of DNA and other negative polyelectrolytes, and controlling the diameter and aspect ratio of the pores with near single Ångstrom precision. The control over the chemical and physical nature of the pore surface provided by atomic layer deposition produced a higher yield of functional nanopore detectors.en
dc.description.sponsorshipMolecular and Cellular Biologyen
dc.description.sponsorshipPhysicsen
dc.description.sponsorshipChemistry and Chemical Biologyen
dc.description.sponsorshipEngineering and Applied Sciencesen
dc.language.isoen_USen
dc.publisherAmerican Chemical Societyen
dc.relation.isversionofhttp://dx.doi.org/10.1021/nl0494001en
dc.relation.hasversionhttp://www.mcb.harvard.edu/branton/ChenEtAl2004.pdfen
dash.licenseLAA
dc.titleAtomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanoporesen
dc.typeJournal Article
dc.description.versionVersion of Record
dc.relation.journalNano Lettersen
dash.depositing.authorBranton, Daniel
dc.identifier.doi10.1021/nl0494001*
dash.contributor.affiliatedBranton, Daniel
dash.contributor.affiliatedGolovchenko, Jene
dash.contributor.affiliatedGordon, Roy


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