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dc.contributor.authorKim, Young-Rok
dc.contributor.authorChen, Peng-Chieh
dc.contributor.authorAziz, Michael
dc.contributor.authorBranton, Daniel
dc.contributor.authorVlassak, Joost
dc.date.accessioned2009-06-16T18:58:14Z
dc.date.issued2006
dc.identifier.citationKim, Young-Rok, Peng Chen, Michael J. Aziz, Daniel Branton, and Joost Vlassak. 2006. Focused ion beam induced deflections of freestanding thin films. Journal of Applied Physics 100(10): 104322.en
dc.identifier.issn0021-8979en
dc.identifier.urihttp://nrs.harvard.edu/urn-3:HUL.InstRepos:3109371
dc.description.abstractProminent deflections are shown to occur in freestanding silicon nitride thin membranes when exposed to a 50 keV gallium focused ion beam for ion doses between 10<sup>14</sup> and 10<sup>17</sup> ions/cm<sup>2</sup>. Atomic force microscope topographs were used to quantify elevations on the irradiated side and corresponding depressions of comparable magnitude on the back side, thus indicating that what at first appeared to be protrusions are actually the result of membrane deflections. The shape in high-stress silicon nitride is remarkably flat-topped and differs from that in low-stress silicon nitride. Ion beam induced biaxial compressive stress generation, which is a known deformation mechanism for other amorphous materials at higher ion energies, is hypothesized to be the origin of the deflection. A continuum mechanical model based on this assumption convincingly reproduces the profiles for both low-stress and high-stress membranes and provides a family of unusual shapes that can be created by deflection of freestanding thin films under beam irradiation.en
dc.description.sponsorshipEngineering and Applied Sciencesen
dc.description.sponsorshipMolecular and Cellular Biologyen
dc.language.isoen_USen
dc.publisherAmerican Institute of Physicsen
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.2363900en
dc.relation.hasversionhttp://www.mcb.harvard.edu/branton/KimEtAl2006.pdfen
dash.licenseLAA
dc.titleFocused Ion Beam Induced Deflections of Freestanding Thin Filmsen
dc.typeJournal Article
dc.description.versionVersion of Record
dc.relation.journalJournal of Applied Physicsen
dash.depositing.authorBranton, Daniel
dc.identifier.doi10.1063/1.2363900*
dash.contributor.affiliatedChen, Peng-Chieh
dash.contributor.affiliatedVlassak, Joost
dash.contributor.affiliatedAziz, Michael
dash.contributor.affiliatedBranton, Daniel


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