Etching of Cr tips for scanning tunneling microscopy of cleavable oxides

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Etching of Cr tips for scanning tunneling microscopy of cleavable oxides

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Title: Etching of Cr tips for scanning tunneling microscopy of cleavable oxides
Author: Huang, Dennis; Liu, Stephen; Zeljkovic, Ilija; Mitchell, J. F.; Hoffman, Jennifer Eve

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Citation: Huang, Dennis, Stephen Liu, Ilija Zeljkovic, J. F. Mitchell, and Jennifer E. Hoffman. 2017. “Etching of Cr Tips for Scanning Tunneling Microscopy of Cleavable Oxides.” Review of Scientific Instruments 88 (2) (February): 023705. doi:10.1063/1.4976567.
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Abstract: We report a detailed three-step roadmap for the fabrication and characterization of bulk Cr tips for spin-polarized scanning tunneling microscopy. Our strategy uniquely circumvents the need for ultra-high vacuum preparation of clean surfaces or films. First, we demonstrate the role of ex-situ electrochemical etch parameters on Cr tip apex geometry, using scanning electron micrographs of over 70 etched tips. Second, we describe the suitability of the in-situ cleaved surface of the layered antiferromagnet La1.4Sr1.6Mn2O7 to evaluate the spin characteristics of the Cr tip, replacing the UHV-prepared test samples that have been used in prior studies. Third, we outline a statistical algorithm that can effectively delineate closely-spaced or irregular cleaved step edges, to maximize the accuracy of step height and spin-polarization measurements.
Published Version: 10.1063/1.4976567
Terms of Use: This article is made available under the terms and conditions applicable to Open Access Policy Articles, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#OAP
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:33464188
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