Synthesis and Characterization of Ruthenium Amidinate Complexes as Precursors for Vapor Deposition
Lim, Booyong S.
Li, HuazhiNote: Order does not necessarily reflect citation order of authors.
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CitationLi, Huazhi, Titta Aaltonen, Zhengwen Li, Booyong S. Lim, Roy G. Gordon. 2008. Synthesis and characterization of ruthenium amidinate complexes as precursors for vapor deposition. The Open Inorganic Chemistry Journal 2: 11-17.
AbstractThree new ruthenium amidinate complexes were prepared: tris(diisopropylacetamidinato)-ruthenium(III), Ru(iPrNC(Me)NiPr)3 4; bis(diisopropyl-acetamidinato)ruthenium(II) dicarbonyl, Ru(iPrNC(Me)NiPr)2(CO)2 5; and bis(ditert- butylacetamidinato)ruthenium(II) dicarbonyl, Ru(tBuNC(Me)NtBu)2(CO)2 6. They have been synthesized and characterized by 1H NMR, TG and X-ray structure analysis. These three complexes were found to be monomeric and air stable. Compound 6 was found to have sufficient volatility and thermal stability for use in chemical vapor deposition (CVD) and atomic layer deposition (ALD) of ruthenium metal films.
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