dc.contributor.author | Wang, Hongtao | |
dc.contributor.author | Gordon, Roy Gerald | |
dc.contributor.author | Alvis, Roger | |
dc.contributor.author | Ulfig, Robert M. | |
dc.date.accessioned | 2009-10-14T12:49:42Z | |
dc.date.issued | 2009-10-14 | |
dc.identifier.citation | Wang, Hongtao, Roy G. Gordon, Roger Alvis, and Robert M. Ulfig. Forthcoming. Atomic layer deposition of ruthenium thin films from an amidinate precursor. Chemical Vapor Deposition. | en_US |
dc.identifier.issn | 0948-1907 | en_US |
dc.identifier.uri | http://nrs.harvard.edu/urn-3:HUL.InstRepos:3347576 | |
dc.description.abstract | Ruthenium thin films were deposited by atomic layer deposition from bis(N,N’-di-tert-butylacetamidinato)ruthenium(II) dicarbonyl and O2. Highly conductive, dense
and pure thin films can be deposited when oxygen exposure EO approaches a certain threshold ( Emax ). When EO > Emax, the film peels off due to the recombinative desorption of O2 at the film/substrate interface. Analysis by an atomic probe microscope shows that the crystallites are nearly free of carbon impurity (<0.1 at.%), while a low level of carbon (<0.5 at.%) is segregated near the grain boundaries. The atom probe
microscope also shows that a small amount of O impurity (0.3 at.%) is distributed uniformly between the crystallites and the grain boundaries. | en_US |
dc.description.sponsorship | Chemistry and Chemical Biology | en_US |
dc.description.sponsorship | Engineering and Applied Sciences | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | John Wiley & Sons | en_US |
dc.relation.isversionof | http://www3.interscience.wiley.com/journal/10003226/home | en_US |
dash.license | OAP | |
dc.subject | O2 exposure | en_US |
dc.subject | atomic layer deposition | en_US |
dc.subject | ruthenium thin films | en_US |
dc.title | Atomic Layer Deposition of Ruthenium Thin Films From an Amidinate Precursor | en_US |
dc.type | Journal Article | en_US |
dc.description.version | Accepted Manuscript | en_US |
dc.relation.journal | Chemical Vapor Deposition | en_US |
dash.depositing.author | Gordon, Roy Gerald | |
dc.date.available | 2009-10-14T12:49:42Z | |
dc.identifier.doi | 10.1002/cvde.200906789 | |
dash.contributor.affiliated | Gordon, Roy | |