Formation of Highly Ordered Self-Assembled Monolayers of Alkynes on Au(111) Substrate

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Formation of Highly Ordered Self-Assembled Monolayers of Alkynes on Au(111) Substrate

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Title: Formation of Highly Ordered Self-Assembled Monolayers of Alkynes on Au(111) Substrate
Author: Zaba, Tomasz; Noworolska, Agnieszka; Bowers, Carleen Morris; Breiten, Benjamin; Whitesides, George McClelland; Cyganik, Piotr

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Citation: Zaba, Tomasz, Agnieszka Noworolska, Carleen Morris Bowers, Benjamin Breiten, George M. Whitesides, and Piotr Cyganik. 2014. Formation of Highly Ordered Self-Assembled Monolayers of Alkynes on Au(111) Substrate. Journal of the American Chemical Society 136, no. 34: 11918–11921. doi:10.1021/ja506647p.
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Abstract: Self-assembled monolayers (SAMs), prepared by reaction of terminal n-alkynes (HC≡C(CH2)nCH3, n = 5, 7, 9, and 11) with Au(111) at 60 °C were characterized using scanning tunneling microscopy (STM), infrared reflection absorption spectroscopy (IRRAS), X-ray photoelectron spectroscopy (XPS), and contact angles of water. In contrast to previous spectroscopic studies of this type of SAMs, these combined microscopic and spectroscopic experiments confirm formation of highly ordered SAMs having packing densities and molecular chain orientations very similar to those of alkanethiolates on Au(111). Physical properties, hydrophobicity, high surface order, and packing density, also suggest that SAMs of alkynes are similar to SAMs of alkanethiols. The formation of high-quality SAMs from alkynes requires careful preparation and manipulation of reactants in an oxygen-free environment; trace quantities of O2 lead to oxidized contaminants and disordered surface films. The oxidation process occurs during formation of the SAM by oxidation of the −C≡C– group (most likely catalyzed by the gold substrate in the presence of O2).
Published Version: doi:10.1021/ja506647p
Terms of Use: This article is made available under the terms and conditions applicable to Open Access Policy Articles, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#OAP
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:33490483
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