Direct-liquid-evaporation chemical vapor deposition of smooth, highly conformal cobalt and cobalt nitride thin films
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https://doi.org/10.1039/c5tc03221kMetadata
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Yang, Jing, Kecheng Li, Jun Feng, and Roy G. Gordon. 2015. “Direct-Liquid-Evaporation Chemical Vapor Deposition of Smooth, Highly Conformal Cobalt and Cobalt Nitride Thin Films.” J. Mater. Chem. C 3 (46): 12098–12106. doi:10.1039/c5tc03221k.Citable link to this page
http://nrs.harvard.edu/urn-3:HUL.InstRepos:33724769
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