Secrets revealed — Spatially selective wetting of plasma-patterned periodic mesoporous organosilica

DSpace/Manakin Repository

Secrets revealed — Spatially selective wetting of plasma-patterned periodic mesoporous organosilica

Citable link to this page

 

 
Title: Secrets revealed — Spatially selective wetting of plasma-patterned periodic mesoporous organosilica
Author: Wang, Wendong; Burgess, Ian; Hatton, Benjamin D.; Alvarenga, Jack; Aizenberg, Joanna

Note: Order does not necessarily reflect citation order of authors.

Citation: Wang, Wendong, Ian B. Burgess, Benjamin D. Hatton, Jack Alvarenga, and Joanna Aizenberg.2012. Secrets revealed — Spatially selective wetting of plasma-patterned periodic mesoporous organosilica. Canadian Journal of Chemistry 90, no. 12: 1063-1068. doi: 10.1139/v2012-092
Full Text & Related Files:
Abstract: We report a simple method to pattern wetting properties on thin films of periodic mesoporous organosilica (PMO). A hydrophobic methane PMO thin film was covered by masks and exposed to oxygen plasma to make the unmasked area hydrophilic. The wettability patterns could be revealed only when the films were immersed in water or exposed to moisture. We expect that our method would extend the utility of PMO to such areas as sensing and information security.
Published Version: doi:10.1139/v2012-092
Terms of Use: This article is made available under the terms and conditions applicable to Open Access Policy Articles, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#OAP
Citable link to this page: http://nrs.harvard.edu/urn-3:HUL.InstRepos:34609601
Downloads of this work:

Show full Dublin Core record

This item appears in the following Collection(s)

 
 

Search DASH


Advanced Search
 
 

Submitters