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dc.contributor.authorNarayan, J.
dc.contributor.authorWhite, C.W.
dc.contributor.authorHolland, O.W.
dc.contributor.authorAziz, Michael J.
dc.date.accessioned2010-02-24T15:31:35Z
dc.date.issued1984
dc.identifier.citationNarayan, J., C.W. White, O.W. Holland, and Michael J. Aziz. 1984. Phase Transformation and impurity redistribution during pulsed laser irradiation of amorphous silicon layers. Journal of Applied Physics 56, no. 6: 1821-1830.en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://nrs.harvard.edu/urn-3:HUL.InstRepos:3693707
dc.description.sponsorshipEngineering and Applied Sciencesen_US
dc.language.isoen_USen_US
dc.publisherAmerican Institute of Physicsen_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.334192en_US
dash.licenseLAA
dc.titlePhase Transformation and Impurity Redistribution During Pulsed Laser Irradiation of Amorphous Silicon Layersen_US
dc.typeJournal Articleen_US
dc.description.versionVersion of Recorden_US
dc.relation.journalJournal of Applied Physicsen_US
dash.depositing.authorAziz, Michael J.
dc.date.available2010-02-24T15:31:35Z
dc.identifier.doi10.1063/1.334192*
dash.contributor.affiliatedAziz, Michael


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