Thermal Diffuse X-Ray-Scattering Studies of the Water-Vapor Interface
Schwartz, D. K.
Schlossman, M. L.
Kawamoto, E. H.
Kellogg, G. J.
Ocko, B. M.
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CitationSchwartz, D. K., M. L. Schlossman, E. H. Kawamoto, G. J. Kellogg, Peter S. Pershan, and B. M. Ocko. 1990. Thermal diffuse x-ray-scattering studies of the water-vapor interface. Physical Review A 41(10): 5687-5690.
AbstractAgreement between the theoretical and measured resolution dependence of x-ray specular reflection from the H2O-vapor interface shows that the macroscopic capillary model for surface roughness can be extended to length scales as small as 400 Å. Agreement between measured thermal diffuse scattering data and the theoretical form, with no significant adjustable parameters, independently leads to similar conclusions.
Citable link to this pagehttp://nrs.harvard.edu/urn-3:HUL.InstRepos:8609120
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