Low Temperature Atomic Layer Deposition of Tin Dioxide, SnO\(_2\)

Heo, Jae Yeong; Hock, Adam S.; Gordon, Roy Gerald

View/Open

ALD SnO2-slides.pdf (1.649Mb)

Author

Heo, Jae Yeong HARVARD

Hock, Adam S.

Gordon, Roy Gerald HARVARD

Published Version

https://doi.org/10.1021/cm1011108

Metadata

Show full item record

Citation

Heo, Jaeyeong, Adam S. Hock, and Roy G. Gordon. 2010. Low temperature atomic layer deposition of tin dioxide, SnO\(_2\). Presentation slides. 10th International Conference on Atomic Layer Deposition. Seoul, South Korea.

Terms of Use

This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA

Citable link to this page

http://nrs.harvard.edu/urn-3:HUL.InstRepos:8961464

Collections

FAS Scholarly Articles [14518]

Contact administrator regarding this item (to report mistakes or request changes)