Low Temperature Atomic Layer Deposition of Tin Dioxide, SnO\(_2\)
MetadataShow full item record
CitationHeo, Jaeyeong, Adam S. Hock, and Roy G. Gordon. 2010. Low temperature atomic layer deposition of tin dioxide, SnO\(_2\). Presentation slides. 10th International Conference on Atomic Layer Deposition. Seoul, South Korea.
Citable link to this pagehttp://nrs.harvard.edu/urn-3:HUL.InstRepos:8961464
- FAS Scholarly Articles