Low Temperature Atomic Layer Deposition of Tin Dioxide, SnO\(_2\)

Heo, Jae Yeong; Hock, Adam S.; Gordon, Roy Gerald

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Heo, Jae Yeong HARVARD

Hock, Adam S.

Gordon, Roy Gerald HARVARD

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https://doi.org/10.1021/cm1011108

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Heo, Jaeyeong, Adam S. Hock, and Roy G. Gordon. 2010. Low temperature atomic layer deposition of tin dioxide, SnO\(_2\). Presentation slides. 10th International Conference on Atomic Layer Deposition. Seoul, South Korea.

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