Title: | Low Temperature Atomic Layer Deposition of Tin Dioxide, SnO\(_2\) |
Author: |
Heo, Jae Yeong; Hock, Adam S.; Gordon, Roy Gerald
Note: Order does not necessarily reflect citation order of authors. |
Citation: | Heo, Jaeyeong, Adam S. Hock, and Roy G. Gordon. 2010. Low temperature atomic layer deposition of tin dioxide, SnO\(_2\). Presentation slides. 10th International Conference on Atomic Layer Deposition. Seoul, South Korea. |
Full Text & Related Files: |
ALD SnO2-slides.pdf (1.729Mb; PDF) ![]() |
Terms of Use: | This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA |
Citable link to this page: | http://nrs.harvard.edu/urn-3:HUL.InstRepos:8961464 |
Downloads of this work: |
Contact administrator regarding this item (to report mistakes or request changes)