Surface Chemistry of Copper Precursors in Connection with Atomic Layer Deposition (ALD) Processes

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Ma, Qiang

Gordon, Roy Gerald

Zaera, Francisco

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Ma, Qiang, Roy G. Gordon and Francisco Zaera. 2011. Surface chemistry of copper precursors in connection with atomic layer deposition (ALD) processes. Paper presented at The 11th International Conference on Atomic Layer Deposition, Cambridge, MA, June 26-29, 2011.

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This article is made available under the terms and conditions applicable to Other Posted Material, as set forth at http://nrs.harvard.edu/urn-3:HUL.InstRepos:dash.current.terms-of-use#LAA

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http://nrs.harvard.edu/urn-3:HUL.InstRepos:9639953